Chemical mechanical polishing endpoint detection
A Standard patent application filed on 11 October 2002 credited to Talieh, Homayoun ; Basol, Bulent M.

Details

Application number :
2002347876  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Chemical mechanical polishing endpoint detection  
Inventor :
Talieh, Homayoun ; Basol, Bulent M.  
Agent name :
 
Address for service :
 
Filing date :
11 October 2002  
Associated companies :
 
Applicant name :
NUTOOL, INC.  
Applicant address :
1645 McCandless Drive, Milpitas, CA 95035  
Old name :
 
Original Source :
Go  

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