End point detection system for chemical mechanical polishing applications
A Standard patent application filed on 26 June 2001 credited to Mikhaylich, Katrina A.
;
Gotkis, Yehiel
;
Ravkin, Mike
Details
Application number :
2001271468
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
End point detection system for chemical mechanical polishing applications
Inventor :
Mikhaylich, Katrina A.
;
Gotkis, Yehiel
;
Ravkin, Mike