Method and apparatus for electrodeposition or etching of uniform film with minimal edge exclusion on substrate
A Standard patent application filed on 02 November 2001 credited to Basol, Bulent M. ; Talieh, Homayoun ; Uzoh, Cyprian

Details

Application number :
2002246910  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method and apparatus for electrodeposition or etching of uniform film with minimal edge exclusion on substrate  
Inventor :
Basol, Bulent M. ; Talieh, Homayoun ; Uzoh, Cyprian  
Agent name :
 
Address for service :
 
Filing date :
02 November 2001  
Associated companies :
 
Applicant name :
NUTOOL, INC.  
Applicant address :
1645 McCandless Drive, Milpitas, CA 95035  
Old name :
 
Original Source :
Go  

Same Inventor