Method of and apparatus for making electrical contact to wafer surface for full-face electroplating or electropolishing
A Standard patent application filed on 18 April 2001 credited to Nagorski, Boguslaw A.
;
Basol, Bulent M.
;
Ashjaee, Jalal
;
Talieh, Homayoun
;
Uzoh, Cyprian
Details
Application number :
2001253635
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method of and apparatus for making electrical contact to wafer surface for full-face electroplating or electropolishing
Inventor :
Nagorski, Boguslaw A.
;
Basol, Bulent M.
;
Ashjaee, Jalal
;
Talieh, Homayoun
;
Uzoh, Cyprian