Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography
A Standard patent application filed on 14 November 2000 credited to Fryd, Michael ; Periyasamy, Mookkan ; Schadt, Frank Leonard III

Details

Application number :

16031  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography  

Inventor :

Fryd, Michael ; Periyasamy, Mookkan ; Schadt, Frank Leonard III  

Agent name :

 

Address for service :

 

Filing date :

14 November 2000  

Associated companies :

 

Applicant name :

E.I. Du Pont De Nemours and Company  

Applicant address :

 

Old name :

 

Original Source :

Go  

Same Inventor

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