Polymers for photoresist compositions for microlithography
A Standard patent application filed on 04 May 2001 credited to Schadt Iii, Frank Leonard ; Periyasamy, Mookkan ; Fryd, Michael

Details

Application number :

2001259509  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Polymers for photoresist compositions for microlithography  

Inventor :

Schadt Iii, Frank Leonard ; Periyasamy, Mookkan ; Fryd, Michael  

Agent name :

 

Address for service :

 

Filing date :

04 May 2001  

Associated companies :

 

Applicant name :

E.I. Du Pont De Nemours and Company  

Applicant address :

 

Old name :

 

Original Source :

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