Plasma sputter etching system with reduced particle contamin ation
A Standard patent application filed on 18 October 1995 credited to Lantsman, Alexander D

Details

Application number :
39497  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma sputter etching system with reduced particle contamin ation  
Inventor :
Lantsman, Alexander D  
Agent name :
 
Address for service :
 
Filing date :
18 October 1995  
Associated companies :
 
Applicant name :
Materials Research Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor