Polishing pad for planarization
A Standard patent application filed on 18 September 2003 credited to Wang, Alan E. ; Allison, William C. ; Swisher, Robert

Details

Application number :
2003272674  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Polishing pad for planarization  
Inventor :
Wang, Alan E. ; Allison, William C. ; Swisher, Robert  
Agent name :
 
Address for service :
 
Filing date :
18 September 2003  
Associated companies :
 
Applicant name :
PPG INDUSTRIES OHIO, INC.  
Applicant address :
3800 West 143rd Street, Cleveland, OH 44111  
Old name :
 
Original Source :
Go  

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