Polishing pad contour indicator for mechanical or chemical-mechanical planarization
A Standard patent application filed on 03 October 1997 credited to Henderson, Gary O.

Details

Application number :

47432  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Polishing pad contour indicator for mechanical or chemical-mechanical planarization  

Inventor :

Henderson, Gary O.  

Agent name :

 

Address for service :

 

Filing date :

03 October 1997  

Associated companies :

 

Applicant name :

Micron Technology, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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