Method and apparatus for improved temperature control in atomic layer deposition
A Standard patent application filed on 09 November 2001 credited to Chiang, Tony P. ; Leeser, Karl F.

Details

Application number :
2002256973  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method and apparatus for improved temperature control in atomic layer deposition  
Inventor :
Chiang, Tony P. ; Leeser, Karl F.  
Agent name :
 
Address for service :
 
Filing date :
09 November 2001  
Associated companies :
 
Applicant name :
ANGSTRON SYSTEMS, INC.  
Applicant address :
3350 Scott Boulevard #62, Santa Clara, CA 95054  
Old name :
 
Original Source :
Go  

Same Inventor