System and method for modulated ion-induced atomic layer deposition (mii-ald)
A Standard patent application filed on 09 November 2001 credited to Chiang, Tony P. ; Leeser, Karl F.

Details

Application number :
2002232844  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
System and method for modulated ion-induced atomic layer deposition (mii-ald)  
Inventor :
Chiang, Tony P. ; Leeser, Karl F.  
Agent name :
 
Address for service :
 
Filing date :
09 November 2001  
Associated companies :
 
Applicant name :
Angstron Systems, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor