Atomic layer deposition system and method
A Standard patent application filed on 27 March 2002 credited to Babcoke, Jason E.
;
Chiang, Tony P.
;
Leeser, Karl F.
;
Brown, Jeffrey A.
Details
Application number :
2002303195
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Atomic layer deposition system and method
Inventor :
Babcoke, Jason E.
;
Chiang, Tony P.
;
Leeser, Karl F.
;
Brown, Jeffrey A.
Agent name :
Address for service :
Filing date :
27 March 2002
Associated companies :
Applicant name :
ANGSTRON SYSTEMS, INC.
Applicant address :
3350 Scott Boulevard, Building 62, Santa Clara, CA 95054