Positive resist composition and method of forming resist pattern

Application number :: 2002354259
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Positive resist composition and method of forming resist pattern
Inventor :: Hada, Hideo ; Iwai, Takeshi ; Fujimura, Satoshi ; Kubota, Naotaka
Agent name :
Address for service :
Filing date :: 29 November 2002
Associated companies :
Applicant name :: TOKYO OHKA KOGYO CO., LTD.
Applicant address :: 150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 211-0012
Old name :
Original Source :: Go

Positive resist composition and method of forming resist pattern A Standard patent application filed on 29 November 2002 credited to Hada, Hideo ; Iwai, Takeshi ; Fujimura, Satoshi ; Kubota, Naotaka