Positive resist composition and method of forming resist pattern from the same
A Standard patent application filed on 29 November 2002 credited to Hada, Hideo ; Miyairi, Miwa ; Iwai, Takeshi ; Fujimura, Satoshi ; Kubota, Naotaka

Details

Application number :

2002354248  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Positive resist composition and method of forming resist pattern from the same  

Inventor :

Hada, Hideo ; Miyairi, Miwa ; Iwai, Takeshi ; Fujimura, Satoshi ; Kubota, Naotaka  

Agent name :

 

Address for service :

 

Filing date :

29 November 2002  

Associated companies :

 

Applicant name :

TOKYO OHKA KOGYO CO., LTD.  

Applicant address :

150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 211-0012  

Old name :

 

Original Source :

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