Apparatus and methods for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishing
A Standard patent application filed on 28 March 2002 credited to Saldana, Miguel A.
;
Williams, Damon Vincent
Details
Application number :
2002254492
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Apparatus and methods for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishing