Stepper exposure dose control base upon across wafer variations in photoresist thickness
A Standard patent application filed on 25 January 2002 credited to Pasadyn, Alexander J.
;
Hewett, Joyce S. Oey
;
Bode, Christopher A.
Details
Application number :
2002247021
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Stepper exposure dose control base upon across wafer variations in photoresist thickness
Inventor :
Pasadyn, Alexander J.
;
Hewett, Joyce S. Oey
;
Bode, Christopher A.
Agent name :
Address for service :
Filing date :
25 January 2002
Associated companies :
Applicant name :
ADVANCED MICRO DEVICES, INC.
Applicant address :
One AMD Place, Mail Stop 68, Sunnyvale, CA 94088-3453