Method and apparatus for controlling feature critical dimensions based on scatterometry derived profile
A Standard patent application filed on 22 October 2001 credited to Pasadyn, Alexander J. ; Peterson, Anastasia Oshelski ; Toprac, Anthony J. ; Sonderman, Thomas J. ; Hewett, Joyce Oey S. ; Miller, Michael L. ; Bode, Christopher A.

Details

Application number :

2002228894  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for controlling feature critical dimensions based on scatterometry derived profile  

Inventor :

Pasadyn, Alexander J. ; Peterson, Anastasia Oshelski ; Toprac, Anthony J. ; Sonderman, Thomas J. ; Hewett, Joyce Oey S. ; Miller, Michael L. ; Bode, Christopher A.  

Agent name :

 

Address for service :

 

Filing date :

22 October 2001  

Associated companies :

 

Applicant name :

ADVANCED MICRO DEVICES, INC.  

Applicant address :

One AMD Place, Mail Stop 68, Sunnyvale, CA 94088-3453  

Old name :

 

Original Source :

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