Fluid distribution system and process, and semiconductor fabrication facility utilizing same

Application number :: 2001296849
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Fluid distribution system and process, and semiconductor fabrication facility utilizing same
Inventor :: Brandes, George R ; Baum, Thomas H. ; Tischler, Michael A.
Agent name :
Address for service :
Filing date :: 06 August 2001
Associated companies :
Applicant name :: Advanced Technology Materials, Inc.
Applicant address :
Old name :
Original Source :: Go

Fluid distribution system and process, and semiconductor fabrication facility utilizing same A Standard patent application filed on 06 August 2001 credited to Brandes, George R ; Baum, Thomas H. ; Tischler, Michael A.