Stepper exposure dose control based upon across wafer variations in device characteristics
A Standard patent application filed on 04 October 2001 credited to Hewett, Joyce S. Oey
;
Toprac, Anthony J.
Details
Application number :
2001296629
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Stepper exposure dose control based upon across wafer variations in device characteristics
Inventor :
Hewett, Joyce S. Oey
;
Toprac, Anthony J.
Agent name :
Address for service :
Filing date :
04 October 2001
Associated companies :
Applicant name :
ADVANCED MICRO DEVICES, INC.
Applicant address :
One AMD Place, Mail Stop 68, Sunnyvale, CA 94088-3453