Photomask, aberration correcting plate, exposure device and method of producing microdevice
A Standard patent application filed on 10 November 1998 credited to Shiraishi, Naomasa ; Owa, Soichi ; Takeuchi, Hitoshi

Details

Application number :

97639  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Photomask, aberration correcting plate, exposure device and method of producing microdevice  

Inventor :

Shiraishi, Naomasa ; Owa, Soichi ; Takeuchi, Hitoshi  

Agent name :

 

Address for service :

 

Filing date :

10 November 1998  

Associated companies :

 

Applicant name :

Nikon Corporation  

Applicant address :

 

Old name :

 

Original Source :

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