Method for forming titanium silicide and titanium by cvd
A Standard patent application filed on 21 August 1998 credited to Doan, Trung T. ; Sharan, Sujit ; Prall, Kirk D ; Sandhu, Gurtej Singh

Details

Application number :

90295  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method for forming titanium silicide and titanium by cvd  

Inventor :

Doan, Trung T. ; Sharan, Sujit ; Prall, Kirk D ; Sandhu, Gurtej Singh  

Agent name :

 

Address for service :

 

Filing date :

21 August 1998  

Associated companies :

 

Applicant name :

Micron Technology, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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