Method to detect metal impurities in the semiconductor process gases
A Standard patent application filed on 23 June 1998 credited to Suzuki, Itsuko ; Tarutani, Kohei

Details

Application number :

88040  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method to detect metal impurities in the semiconductor process gases  

Inventor :

Suzuki, Itsuko ; Tarutani, Kohei  

Agent name :

 

Address for service :

 

Filing date :

23 June 1998  

Associated companies :

 

Applicant name :

L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude  

Applicant address :

 

Old name :

 

Original Source :

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