Low temperature, high quality silicon dioxide thin films deposited using tetramethylsilane (tms)
A Standard patent application filed on 06 July 1998 credited to Fonash, Stephen J. ; Reber, Douglas M.

Details

Application number :

87571  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Low temperature, high quality silicon dioxide thin films deposited using tetramethylsilane (tms)  

Inventor :

Fonash, Stephen J. ; Reber, Douglas M.  

Agent name :

 

Address for service :

 

Filing date :

06 July 1998  

Associated companies :

 

Applicant name :

Penn State Research Foundation, The  

Applicant address :

 

Old name :

 

Original Source :

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