Pattern-forming methods and radiation sensitive materials
A Standard patent application filed on 02 July 1998 credited to McCullough, Christopher David ; Ray, Kevin Barry ; Spowage, Mark John ; Bayes, Stuart ; Monk, Alan Stanley Victor

Details

Application number :

82290  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Pattern-forming methods and radiation sensitive materials  

Inventor :

McCullough, Christopher David ; Ray, Kevin Barry ; Spowage, Mark John ; Bayes, Stuart ; Monk, Alan Stanley Victor  

Agent name :

 

Address for service :

 

Filing date :

02 July 1998  

Associated companies :

 

Applicant name :

Horsell Graphic Industries Limited  

Applicant address :

 

Old name :

 

Original Source :

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