Vertical furnace for the treatment of semiconductor substrates
A Standard patent application filed on 05 May 1998 credited to Buijze, Jacobus Pieter
;
Stohr, Hubertus Johannes Julius
;
De Ridder, Christianus Gerardus Maria
;
Stoutjesdijk, Jeroen Jan
Details
Application number :
74567
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Vertical furnace for the treatment of semiconductor substrates
Inventor :
Buijze, Jacobus Pieter
;
Stohr, Hubertus Johannes Julius
;
De Ridder, Christianus Gerardus Maria
;
Stoutjesdijk, Jeroen Jan