Electron optics for multi-beam electron beam lithography tool
A Standard patent application filed on 23 November 2000 credited to Parker, N. William
;
Brodie, Alan D.
;
Matter, Michael C.
;
Yin, Edward M.
;
Guo, George
Details
Application number :
19265
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Electron optics for multi-beam electron beam lithography tool
Inventor :
Parker, N. William
;
Brodie, Alan D.
;
Matter, Michael C.
;
Yin, Edward M.
;
Guo, George