An improved method and apparatus for detecting optimal endpoints in plasma etch processes
A Standard patent application filed on 28 June 1996 credited to Liu, Alexander F.

Details

Application number :
63421  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
An improved method and apparatus for detecting optimal endpoints in plasma etch processes  
Inventor :
Liu, Alexander F.  
Agent name :
 
Address for service :
 
Filing date :
28 June 1996  
Associated companies :
 
Applicant name :
Lam Research Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor