A process for fabricating semiconductor devices with shallowly doped regions using dopant compounds containing elements of high solid solubility
A Standard patent application filed on 19 January 1996 credited to Tien, Tien
;
Ling, Peiching
Details
Application number :
48999
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
A process for fabricating semiconductor devices with shallowly doped regions using dopant compounds containing elements of high solid solubility