Lithography using quantum entangled particles
A Standard patent application filed on 19 May 2000 credited to Williams, Colin ; Della Rosa, Giovanni ; Dowling, Jonathan

Details

Application number :

73288  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Lithography using quantum entangled particles  

Inventor :

Williams, Colin ; Della Rosa, Giovanni ; Dowling, Jonathan  

Agent name :

 

Address for service :

 

Filing date :

19 May 2000  

Associated companies :

 

Applicant name :

California Institute of Technology  

Applicant address :

 

Old name :

 

Original Source :

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