A method of forming a mask pattern for the production of a semiconductor
A Standard patent application filed on 10 August 1988 credited to Nishiguchi, Masanori
;
Fujihira, Mitsuaki
Details
Application number :
20608
Application type :
Standard
Application status :
CEASED
Under opposition :
No
Proceeding type :
Invention title :
A method of forming a mask pattern for the production of a semiconductor
Inventor :
Nishiguchi, Masanori
;
Fujihira, Mitsuaki
Agent name :
Davies Collison Cave
Address for service :
Level 15 1 Nicholson Street MELBOURNE VIC 3000
Filing date :
10 August 1988
Associated companies :
Applicant name :
Sumitomo Electric Industries, Ltd.
Applicant address :
No.15, Kitahama 5-chome, Higashi-ku, Osaka-shi, Osaka-fu, Japan