Gas mixture for cryogenic applications
A Standard patent application filed on 27 March 2000 credited to Li, Hong
;
Ryba, Eric
;
Reu, Eugene
;
Taut, Daniel
Details
Application number :
41776
Application type :
Standard
Application status :
CEASED
Under opposition :
No
Proceeding type :
Invention title :
Gas mixture for cryogenic applications
Inventor :
Li, Hong
;
Ryba, Eric
;
Reu, Eugene
;
Taut, Daniel
Agent name :
Davies Collison Cave
Address for service :
GPO Box 3876 SYDNEY NSW 2001
Filing date :
27 March 2000
Associated companies :
Applicant name :
CryoGen, Inc.
Applicant address :
11065 Sorrento Valley Court San Diego CA 92121 United States Of America