Chemical amplification type silicone base positive photoresist composition
A Standard patent application filed on 01 December 2003 credited to Kawana, Daisuke ; Sato, Kazufumi ; Yamada, Tomotaka ; Hirayama, Taku ; Tamura, Kouki

Details

Application number :

2003302990  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Chemical amplification type silicone base positive photoresist composition  

Inventor :

Kawana, Daisuke ; Sato, Kazufumi ; Yamada, Tomotaka ; Hirayama, Taku ; Tamura, Kouki  

Agent name :

 

Address for service :

 

Filing date :

01 December 2003  

Associated companies :

 

Applicant name :

TOKYO OHKA KOGYO CO., LTD.  

Applicant address :

150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 211-0012  

Old name :

 

Original Source :

Go  

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