Room temperature wet chemical growth process of sio based oxides on silicon
A Standard patent application filed on 17 March 2000 credited to Faur, Maria ; Faur, Mircea ; Faur, Horia M. ; Bailey, Sheila G. ; Flood, Dennis J.

Details

Application number :

37592  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Room temperature wet chemical growth process of sio based oxides on silicon  

Inventor :

Faur, Maria ; Faur, Mircea ; Faur, Horia M. ; Bailey, Sheila G. ; Flood, Dennis J.  

Agent name :

 

Address for service :

 

Filing date :

17 March 2000  

Associated companies :

 

Applicant name :

Special Materials Research and Technology, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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