Method using indium tin oxide substrate in high throughput screening
A Standard patent application filed on 17 October 2003 credited to Fosdick, Stephen W. ; Evans, David M.

Details

Application number :

2003301345  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method using indium tin oxide substrate in high throughput screening  

Inventor :

Fosdick, Stephen W. ; Evans, David M.  

Agent name :

 

Address for service :

 

Filing date :

17 October 2003  

Associated companies :

 

Applicant name :

RADIUS BIOSCIENCES, INC.  

Applicant address :

16 Lee Road, Medfield, MA 02052  

Old name :

 

Original Source :

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