In-process correction of stage mirror deformations during a photolithography exposure cycle
A Standard patent application filed on 12 December 2003 credited to Hill, Henry A.

Details

Application number :
2003297000  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
In-process correction of stage mirror deformations during a photolithography exposure cycle  
Inventor :
Hill, Henry A.  
Agent name :
 
Address for service :
 
Filing date :
12 December 2003  
Associated companies :
 
Applicant name :
ZYGO CORPORATION  
Applicant address :
21 Laurel Brook Road, Middlefield, CT 06455-0448  
Old name :
 
Original Source :
Go  

Same Inventor