Details
- Application number :
- 2003280802
- Application type :
- Standard
- Application status :
- LAPSED
- Under opposition :
- No
- Proceeding type :
-
- Invention title :
- Method for cleaning substrate processing chamber
- Inventor :
- Yamasaki, Hideaki
;
Nakamura, Kazuhito
;
Kawano, Yumiko
;
Matsuda, Tsukasa
;
Matsuzawa, Koumei
- Agent name :
-
- Address for service :
-
- Filing date :
- 14 November 2003
- Associated companies :
-
- Applicant name :
- TOKYO ELECTRON LIMITED
- Applicant address :
- 3-6, Akasaka 5-Chome, Minato-Ku, Tokyo 107-8481
- Old name :
-
- Original Source :
- Go