Two-layer film for next generation damascene barrier application with good oxidation resistance
A Standard patent application filed on 07 October 2003 credited to Xia, Li-Qun ; Zheng, Yi ; Nemani, Srinivas D.

Details

Application number :

2003279839  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Two-layer film for next generation damascene barrier application with good oxidation resistance  

Inventor :

Xia, Li-Qun ; Zheng, Yi ; Nemani, Srinivas D.  

Agent name :

 

Address for service :

 

Filing date :

07 October 2003  

Associated companies :

 

Applicant name :

APPLIED MATERIALS, INC.  

Applicant address :

3050 Bowers Avenue, Santa Clara, CA 95054  

Old name :

 

Original Source :

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