Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects
A Standard patent application filed on 08 March 2000 credited to Finarov, Moshe ; Ravid, Avi ; Scheiner, David

Details

Application number :

31871  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects  

Inventor :

Finarov, Moshe ; Ravid, Avi ; Scheiner, David  

Agent name :

 

Address for service :

 

Filing date :

08 March 2000  

Associated companies :

 

Applicant name :

Nova Measuring Instruments Ltd.  

Applicant address :

 

Old name :

 

Original Source :

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