Device and method for the electron beam attenuation of reactively formed layers on substrates
A Standard patent application filed on 07 May 2003 credited to Schuhmacher, Bernd ; Schultrich, Bernd ; Hecht, Christian ; Seyfert, Ulf ; Zimmer, Otmar ; Siemroth, Peter ; Schenk, Steffen ; Reinhold, Ekkehart

Details

Application number :

2003239759  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Device and method for the electron beam attenuation of reactively formed layers on substrates  

Inventor :

Schuhmacher, Bernd ; Schultrich, Bernd ; Hecht, Christian ; Seyfert, Ulf ; Zimmer, Otmar ; Siemroth, Peter ; Schenk, Steffen ; Reinhold, Ekkehart  

Agent name :

 

Address for service :

 

Filing date :

07 May 2003  

Associated companies :

 

Applicant name :

FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWAN DTEN FORSCHUNG E.V.  

Applicant address :

Hansastrasse 27c, 80686 Munchen  

Old name :

 

Original Source :

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