Polishing pad for electrochemical-mechanical polishing and methods to manufacture it
A Standard patent application filed on 22 May 2003 credited to Guo, George Xinsheng
;
Basol, Bulent M.
Details
Application number :
2003233676
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Polishing pad for electrochemical-mechanical polishing and methods to manufacture it