Method of depositing an oxide film by chemical vapor deposition
A Standard patent application filed on 20 May 2003 credited to Bartholomew, Lawrence D. ; Yuh, Soon K. ; Park, Seung G.

Details

Application number :

2003233581  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of depositing an oxide film by chemical vapor deposition  

Inventor :

Bartholomew, Lawrence D. ; Yuh, Soon K. ; Park, Seung G.  

Agent name :

 

Address for service :

 

Filing date :

20 May 2003  

Associated companies :

 

Applicant name :

AVIZA TECHNOLOGY, INC  

Applicant address :

440 Kings Village Road, Scotts Valley, CA 95066  

Old name :

 

Original Source :

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