Methodology for repeatable post etch cd in a production tool
A Standard patent application filed on 26 February 2003 credited to Mui, David S. L. ; Liu, Wei ; Sasano, Hiroki

Details

Application number :

2003219875  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Methodology for repeatable post etch cd in a production tool  

Inventor :

Mui, David S. L. ; Liu, Wei ; Sasano, Hiroki  

Agent name :

 

Address for service :

 

Filing date :

26 February 2003  

Associated companies :

 

Applicant name :

APPLIED MATERIALS, INC.  

Applicant address :

3050 Bowers Avenue, Santa Clara, CA 95054  

Old name :

 

Original Source :

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