Method for the deposition of transparent conducting layers by means of sputter gas comprising helium
A Standard patent application filed on 31 March 2003 credited to Goedicke, Klaus ; Winkler, Torsten ; Egel, Manuela

Details

Application number :

2003216906  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method for the deposition of transparent conducting layers by means of sputter gas comprising helium  

Inventor :

Goedicke, Klaus ; Winkler, Torsten ; Egel, Manuela  

Agent name :

 

Address for service :

 

Filing date :

31 March 2003  

Associated companies :

 

Applicant name :

FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E. V.  

Applicant address :

Leonrodstrasse 54, 80636 Munchen  

Old name :

 

Original Source :

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