Method of depositing cvd thin film
A Standard patent application filed on 18 March 2003 credited to Fukagawa, Mitsuru ; Yamoto, Hisayoshi

Details

Application number :

2003213424  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of depositing cvd thin film  

Inventor :

Fukagawa, Mitsuru ; Yamoto, Hisayoshi  

Agent name :

 

Address for service :

 

Filing date :

18 March 2003  

Associated companies :

 

Applicant name :

KABUSHIKI KAISHA WATANABE SHOKO  

Applicant address :

2-16, Nihonbashi-Muromachi 4-chome, Chuo-ku, Tokyo 103-0022  

Old name :

 

Original Source :

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