Method and system for repairing defected photomasks
A Standard patent application filed on 12 December 2002 credited to Zait, Eitan
;
Ben-Zvi, Guy
;
Dmitriev, Vladimir J.
;
Oshemkov, Sergey V.
;
Guletskiy, Nikolay N.
Details
Application number :
2002358960
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method and system for repairing defected photomasks
Inventor :
Zait, Eitan
;
Ben-Zvi, Guy
;
Dmitriev, Vladimir J.
;
Oshemkov, Sergey V.
;
Guletskiy, Nikolay N.