Positive type radiosensitive composition and method for forming pattern
A Standard patent application filed on 19 July 2002 credited to Nishikawa, Akira ; Utaka, Tomohiro ; Tamaki, Kentarou

Details

Application number :

2002355210  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Positive type radiosensitive composition and method for forming pattern  

Inventor :

Nishikawa, Akira ; Utaka, Tomohiro ; Tamaki, Kentarou  

Agent name :

 

Address for service :

 

Filing date :

19 July 2002  

Associated companies :

 

Applicant name :

JSR CORPORATION  

Applicant address :

6-10, Tsukiji 5-chome Chuo-ku, Tokyo 104-8410 Japan  

Old name :

 

Original Source :

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