Exposure control for phase shifting photolithographic masks
A Standard patent application filed on 07 June 2002 credited to Cote, Michel Luc ; Pierrat, Christophe

Details

Application number :

2002349203  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Exposure control for phase shifting photolithographic masks  

Inventor :

Cote, Michel Luc ; Pierrat, Christophe  

Agent name :

 

Address for service :

 

Filing date :

07 June 2002  

Associated companies :

 

Applicant name :

NUMERICAL TECHNOLOGIES, INC.  

Applicant address :

70 W. Plumeria Drive, San Jose, CA 95134  

Old name :

 

Original Source :

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Same Inventor

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