Slurry distributor for chemical mechanical polishing apparatus and method of using the same
A Standard patent application filed on 09 September 2002 credited to Reyes, Alejandro ; Walsh, Cormac ; Saldana, Ernesto ; Yang, Junsheng ; Kajiwara, Jiro ; Liu, Jun ; Moloney, Gerard

Details

Application number :

2002326867  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Slurry distributor for chemical mechanical polishing apparatus and method of using the same  

Inventor :

Reyes, Alejandro ; Walsh, Cormac ; Saldana, Ernesto ; Yang, Junsheng ; Kajiwara, Jiro ; Liu, Jun ; Moloney, Gerard  

Agent name :

 

Address for service :

 

Filing date :

09 September 2002  

Associated companies :

 

Applicant name :

MULTI PLANAR TECHNOLOGIES, INC.  

Applicant address :

45 East Plumeria Drive, San Jose, CA 95134  

Old name :

 

Original Source :

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