Slurry composition for use in chemical mechanical polishing of metal wiring
A Standard patent application filed on 06 August 2002 credited to Yoon, Bo Un
;
Hong, Chang Ki
;
Roh, Hyun Soo
;
Do, Won Joong
;
Lee, Jong Won
;
Lee, Kil Sung
;
Hah, Sang Rok
;
Lee, Jae Seok
Details
Application number :
2002321915
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Slurry composition for use in chemical mechanical polishing of metal wiring
Inventor :
Yoon, Bo Un
;
Hong, Chang Ki
;
Roh, Hyun Soo
;
Do, Won Joong
;
Lee, Jong Won
;
Lee, Kil Sung
;
Hah, Sang Rok
;
Lee, Jae Seok