Protecting groups in polymers, photoresists and processes for microlithography
A Standard patent application filed on 26 November 2001 credited to Feiring, Andrew E. ; Petrov, Viacheslav Alexandrovich ; Schadt, Iii Frank L. ; Smart, Bruce Edmund

Details

Application number :

2002225766  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Protecting groups in polymers, photoresists and processes for microlithography  

Inventor :

Feiring, Andrew E. ; Petrov, Viacheslav Alexandrovich ; Schadt, Iii Frank L. ; Smart, Bruce Edmund  

Agent name :

 

Address for service :

 

Filing date :

26 November 2001  

Associated companies :

 

Applicant name :

E.I. Du Pont De Nemours and Company  

Applicant address :

1007 Market Street Wilmington, DE 19898 United States of America  

Old name :

 

Original Source :

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